DEVICE FOR CLEANING SUBSTRATE CHUCK, DEVICE FOR CONVEYING AND TREATING SUBSTRATE AND METHOD OF CLEANING SUBSTRATE CHUCK

摘要

PROBLEM TO BE SOLVED: To provide a technology for cleaning a substrate chuck, by which a substrate chuck arm is efficiently cleaned in a device for conveying and treating substrates, having a rotary-type substrate chuck arm. ;SOLUTION: The cleaning device has a cover part 10 which covers both of the right and left sides of the substrate chuck arm 30 and whose upper part is formed in a form permitting relative passing of the substrate chuck arm 30 in the up-and down direction, a lifting part 12 for raising and lowering the cover part 10 and a cleaning solution ejecting part 11 which is provided inside the cover part 10 and has ejecting nozzle rows having ejection ports toward a relative passing position of the substrate chuck arm 30. Thereby, cleaning of the substrate chuck arm 30 can be efficiently carried out by cooperative action with the substrate chuck arm 30 corresponding to the structural characteristic of the substrate chuck arm 30 itself.;COPYRIGHT: (C)2001,JPO