Device manufactured by the exposure device, the exposure apparatus, exposure method, and device manufacturing method using the exposure method

摘要

PURPOSE:To improve throughput by performing exposure process and detection of alignment information simultaneously for two substrates to be exposed. CONSTITUTION:Two substrates W1 and (W2) are held abreast on a substrate stage ST. An optical system PL, and a first and a second alignment optical systems AA1a, AA1b, AA2a and AA2b are so located that one substrate W1 (W2) may be exposed for a mask pattern while alignment information for the other W2 (W1) is being detected. Alignment information obtained during exposure process, is used for positioning in exposing a substrate for a mask pattern. Substrate stage ST position-detecting means 11 and 12 for positioning in an exposure position, are so positioned that the Abbe's error will be approx. 0 against the exposure position; substrate stage ST position-detecting means 11 and 13 (11 and 14) for detecting alignment information in an alignment position, are positioned in the same manner as above against the alignment position.