Mark detecting apparatus, and an exposure apparatus equipped with the detection apparatus, and devices manufactured by the exposure apparatus, and the mark detection method, and an exposure method that includes the detection method, and a device manufacturing method comprising the exposure method

摘要

PURPOSE:To detect a mark with high accuracy and at high speed by a method wherein detection ranges of two alignment systems whose detection system mutually differ are separated from each other within the field of view of an object optical system for alignment use. CONSTITUTION:A first photodetection system FIA and a second photodetection system LIA whose optical detection system with reference to reflected light from a mark is different are installed as photodetection systems. A separation means (variable magnification, diaphragm plate) which prescribes that a detection range PE2 by means of the first photodetection system FIA and detection ranges ALx, ALy by means of the second photodetection system LIA are separated from each other is installed within the angle of field of an object optical system. Thereby, when a mark pattern on an object is detected, two different alignment systems can be used alternately only by moving the object between the two detection ranges. As a result, a mark detection and a dislocation measurement can be performed at high speed.