The resist evaluation device and use this the resist application device and the resist application manner

摘要

PURPOSE: To provide a resist coater with an evaluation unit so that defects of an interconnection pattern to be formed on a substrate can be reduced in the process of manufacturing a semiconductor device. ;CONSTITUTION: Before a liquid resist is applied from a resist tank to a rotating wafer 13 such as silicon, that liquid resist is previously applied to a transparent monitor substrate 9. A resist film on this substrate is then exposed to light emitted from a light source 10 such as a laser. The irradiated light is then scattered when passing through the resist film. The amount of dust on the resist film is known by detecting scattered light from the rear surface of the monitor substrate 9 by means of a light receiving unit 11. When the amount is below a standard value, this liquid resist is applied as a non-defective resist onto the wafer 13, so that a resist pattern is formed.;COPYRIGHT: (C)1993,JPO&Japio