Applying the resist on the resist application development device and resist application development method, and the resist membrane process device

摘要

PROBLEM TO BE SOLVED: To provide a resist coating and developing apparatus, a resist coating and developing method, a resist-film processing apparatus, and a resist-film processing method, for reducing a line width roughness.;SOLUTION: The resist coating and developing apparatus 1 includes: a resist-film forming part configured to coat a resist onto a substrate to form a resist film thereon; a resist developing part 18 configured to develop the exposed resist film; a solvent-gas supply part 100 configured to expose the resist film, which has been developed and patterned by the resist developing part 18, to a first solvent having a solubility to the resist film in a gaseous atmosphere; and a solvent supply part 100 configured to supply, to the resist film which has been exposed to the first solvent, a second solvent having a solubility to the resist film.;COPYRIGHT: (C)2011,JPO&INPIT