Applying the resist liquid to the application and development device and application and development

摘要

PROBLEM TO BE SOLVED: To suppress bad influence with respect to a resolving of resist pattern which is caused by waterdrop left on a substrate by liquid immersion exposure in an exposure device performing development treatment with respect to the substrate after carrying out the liquid immersion exposure by forming resist film in the substrate.;SOLUTION: By aiming up a phenomenon in which the water drop attached to the substrate rapidly decreases in size when a certain time has passed, and a deterioration layer (watermark) is formed in the resist film of the substrate, the substrate is processed in conveyance control so that the substrate may be cleaned in a cleaning portion in a time zone before entering a time zone during which a size of the waterdrop rapidly decreases in size after the liquid immersion exposure. In concrete, when a carrying out preparation signal is outputted from the exposure device, substrate conveyance means of interface portion are prior to other conveyance work, and convey the substrate on a conveyance stage to the cleaning portion.;COPYRIGHT: (C)2007,JPO&INPIT