PHASE SHIFT MASK HAVING THREE DIFFERENT PHASE SHIFT REGION AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask having three different phase shift regions for eliminating the problem that corners have roundness in unexposed regions by diffraction and scattering of light, i.e., a corner round problem and a method for manufacturing the same.;SOLUTION: The surface of a transparent substrate is provided with opaque mask patterns 415 which cover the first part of the transparent substrate and expose the second part of the transparent substrate. The proximate regions around the corners of the opaque mask patterns are evenly divided to the three different phase shift regions 430, 440 and 450 at a phase shift of 120° from each other. These three phase shift regions are achieved by two times of etching steps for forming the first phase shift 430 and the second phase shift region 440. Namely, the region subjected to both of two times of the etching steps is the third phase shift region 450.;COPYRIGHT: (C)2001,JPO