首页> 外国专利> MANUFACTURING METHOD OF MEMS STRUCTURE ENABLING WAFER LEVEL VACUUM PACKAGING

MANUFACTURING METHOD OF MEMS STRUCTURE ENABLING WAFER LEVEL VACUUM PACKAGING

机译:MEMS结构使晶圆级真空包装的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an MEMS structure enabling wafer level vacuum packaging. ;SOLUTION: This method includes: a first step of forming on a first wafer a laminated layer of a multilayered structure including a signal line, a second step of attaching a second wafer to the laminated layer of the multilayered structure, a third step of grinding the first wafer to a predetermined thickness, a fourth step of forming on the first wafer an MEMS structure connected to the signal line and positioned inside a vacuum region and a pad positioned outside the vacuum region, a fifth step of forming on a third wafer a structure having a space corresponding to the vacuum region of the MEMS structure, and a sixth step of combining the ground surface of the first wafer with the third wafer in a vacuum environment.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:提供一种能够进行晶圆级真空封装的MEMS结构的制造方法。 ;解决方案:该方法包括:在第一晶片上形成包括信号线的多层结构的层压层的第一步,将第二晶片附着到该多层结构的层压层的第二步,研磨的第三步第一晶片至预定厚度,第四步骤,在第一晶片上形成连接至信号线并位于真空区内部的MEMS结构,以及位于真空区外部的焊盘,第五步骤,在第三晶片上形成具有与MEMS结构的真空区域相对应的空间的结构,以及在真空环境中将第一晶片的地面与第三晶片结合的第六步骤。版权所有:(C)2001,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号