首页> 外国专利> ABRASIVE MATERIAL, PRODUCTION METHOD THEREOF, AND POLISHING METHOD USING ASME

ABRASIVE MATERIAL, PRODUCTION METHOD THEREOF, AND POLISHING METHOD USING ASME

机译:使用ASME的磨料,其生产方法和抛光方法

摘要

PROBLEM TO BE SOLVED: To provide a finely particulate abrasive material which enables a fine surface roughness, a high polishing speed, and a polishing speed with a high reproducibility even in a neutral pH range to be achieved and which is dispersed easily and stably in a medium; a stable slurry abrasive material containing the finely particulate abrasive material; a method for producing the slurry abrasive material; and a polishing method using the slurry abrasive material. ;SOLUTION: A finely particulate abrasive material is provided which is fine composite particles comprising fine silicon oxide particles and fine cerium oxide particles adhered thereto, the amount of the cerium oxide particles being 5-40 pts.wt. based on 100 pts.wt. silicon oxide particles. A slurry abrasive material using the finely particulate abrasive material, a production method therefor, and a one-step polishing method using the slurry abrasive material are also provided.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种细颗粒的磨料,即使在中性的pH范围内也能实现精细的表面粗糙度,高抛光速度和高再现性的抛光速度,并且容易稳定地分散在中;包含细粒状磨料的稳定的浆状磨料;浆料磨料的制造方法;以及使用浆料磨料的抛光方法。 ;解决方案:提供了一种细颗粒的磨料,其是由细的氧化硅颗粒和细的氧化铈颗粒粘附于其上的复合细颗粒,氧化铈颗粒的量为5-40pts.wt。基于100pts.wt。氧化硅颗粒。还提供了一种使用细颗粒磨料的浆料磨料,其制造方法以及使用该浆料磨料的一步抛光方法。COPYRIGHT:(C)2001,JPO

著录项

  • 公开/公告号JP2001200243A

    专利类型

  • 公开/公告日2001-07-24

    原文格式PDF

  • 申请/专利权人 SUMITOMO OSAKA CEMENT CO LTD;

    申请/专利号JP20000012608

  • 发明设计人 KUBO KENJI;KINOSHITA NOBORU;

    申请日2000-01-21

  • 分类号C09K3/14;B24B37/00;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:56

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