首页> 外国专利> METHOD FOR PRODUCING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL AND PRODUCED COMPOUND SEMICONDUCTOR SINGLE CRYSTAL

METHOD FOR PRODUCING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL AND PRODUCED COMPOUND SEMICONDUCTOR SINGLE CRYSTAL

机译:复合半导体单晶的制造方法及复合半导体单晶的制造方法

摘要

PROBLEM TO BE SOLVED: To efficiently produce a single crystal while preventing the formation of a twin crystal when a compound semiconductor single crystal is grown by an LEC method. ;SOLUTION: The rotational velocity of a crystal is set to be 10 to 15 rpm. When a shoulder part of the crystal is grown, a crucible is rotated with a rotational velocity of 20 to 35 rpm in the direction reverse to the rotational direction of the crystal, and when a straight body part of the crystal is grown, the crucible is rotated with a rotational velocity of 15 to 25 rpm in the direction reverse to the rotational direction of the crystal so that the relative rotational velocity of the crystal to the crucible at growing of the straight body part is lower than that at growing of the shoulder part of the crystal. The radio (d/D) of the diameter (d) of the straight body part of the grown compound semiconductor crystal to the diameter (D) of the crucible is adjusted to be ≥0.3 and ≤0.8.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:当通过LEC方法生长化合物半导体单晶时,为了有效地生产单晶同时防止双晶的形成。 ;解决方案:晶体的旋转速度设置为10到15 rpm。当晶体的肩部生长时,坩埚在与晶体的旋转方向相反的方向上以20至35 rpm的旋转速度旋转,并且当晶体的笔直部分生长时,坩埚为在与晶体的旋转方向相反的方向上以15到25 rpm的旋转速度旋转,因此在笔直的身体部分的生长过程中,晶体对坩埚的相对旋转速度比在肩部的生长过程中低水晶。将生长的化合物半导体晶体的笔直部分的直径(d)对坩埚的直径(D)的射电比(d / D)调整为≥ 0.3和≤ 0.8。; COPYRIGHT:(C日本特许厅

著录项

  • 公开/公告号JP2001106592A

    专利类型

  • 公开/公告日2001-04-17

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;

    申请/专利号JP19990286461

  • 发明设计人 YAJIMA KATSUHIKO;

    申请日1999-10-07

  • 分类号C30B15/22;C30B27/02;C30B29/40;H01L21/208;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:44

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