RESIN FOR PHOTORESIST, ITS PRODUCING METHOD AND PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To produce a resin for photoresist of superior homogeneity and capable of giving a fine pattern with high resolution. ;SOLUTION: The resin for photoresist comprises a copolymer of a monomer A, having a relatively high rate of polymerization and a monomer B having a relatively low rate of polymerization. The resin-producing method comprises a preceding step, in which the monomers A and B are fed into a reaction system in such a way that the abundance ratio k between the monomers A and B in the reaction system (A/B: molar ratio) is made less than the composition ratio α between the monomers A and B in the copolymer (A/B; molar ratio) and the monomers are polymerized, and a subsequent step in which the remaining monomers are fed into the system and polymerized. A vinyl monomer having an alicyclic hydrocarbon skeleton may be used as the monomer B.;COPYRIGHT: (C)2001,JPO