PHOTOREACTION PROCESSING METHOD AND PHOTOREACTION PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photoreaction processing method and device constituted in such a manner that the finer processing to a workpiece is made possible and a degree of freedom in processing may be expanded in the smallest possible form. ;SOLUTION: In the photoreaction method of etching the workpiece W consisting of a non-metallic material by irradiating the workpiece with radiation light of a wavelength to induce a non-thermal reaction, the desired position at the surface to be processed of the workpiece W is irradiated with the radiation light arbitrarily regulated in the irradiation time or irradiation intensity and luminous flux from a desired bearing, by which the progression direction and depth of the etching are controlled. If the form of directly irradiating the workpiece W with the radiation light is adopted in the manner described above, the need for the mask of the prior examples is eliminated. Even more, the free variable setting of the irradiation bearing of the radiation light to the workpiece W is made possible and therefore there is no need for limiting the progressing direction of the etching.;COPYRIGHT: (C)2001,JPO