ELECTRON BEAM EXPOSURE MASK, ELECTRON BEAM EXPOSURE METHOD USING THIS, ELECTRON BEAM ALIGNER AND MANUFACTURE OF DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposure mask of a constitution, wherein the exposure mask is provided with a plurality of split masks and even though a defect is caused in the split masks, a required pattern can be exposed by an electron beam exposure, an exposure method using this mask and an aligner. ;SOLUTION: An exposure mask is formed into a constitution, wherein the exposure mask is provided with a main mask MM constituted of a plurality of split masks MDM and a compensating mask CM, which is formed into the same constitution as that of the split mask MDM inhering in the main mask MM and having a defect and comprises split masks CDM having no defect. When exposure of patterns are performed in order using the split masks MDM of the main mask MM and a pattern is exposed using the split mask MDM having the defect of the mask MM, the exposure is performed using the split mask CDM, which corresponds to the mask MDM having the defect and has no defect, of the mask CM. In the main mask MM, it is not necessarily needed that all the split masks MDM are respectively constituted of a split mask having no defect, the substantial yield of the manufacture of the exposure mask is raised, a shortening of the forming time of the exposure mask is enabled and a reduction in the cost of the exposure mask can be realized.;COPYRIGHT: (C)2001,JPO