The electron beam exposure device and the exposure method of using the mask for multiple column electron beam exposure and the mask for multiple column electron beam exposure

摘要

Topic Offer the electron beam exposure device and the exposure method of using the mask for multiple column electron beam exposure and the mask for multiple column electron beam exposure which make loading easy in the multiple column electron beam exposure device.SolutionsThe mask for exposure which is used in the multiple column electron beam exposure device which possesses the plural column cells has the stencil pattern group which consists of plural stencil patterns to every plural column cells, the stencil pattern group distribution facilities is done in the interval which corresponds to the arrangement interval of the plural column cells, everything of the stencil pattern group is formed to the single mask baseplate. As for the stencil pattern group, each electron beam of the plural column cells the 1st stencil pattern group which is formed to the range where it is deflection possible and, the plural units it has the 1st stencil pattern group is formed from the 2nd stencil pattern group which Selective figure Figure 4