NEGATIVE TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION FOR DEVELOPMENT WITH BASIC AQUEOUS SOLUTION AND PRODUCTION OF PATTERN USING SAME

摘要

PROBLEM TO BE SOLVED: To obtain a negative type photosensitive polyimide precursor composition developable with a basic aqueous solution, excellent in photosensitive characteristics, having high sensitivity, giving a pattern of a good shape even with low light exposure, having a high rate of a residual film after development and excellent also in shelf stability and characteristics of a cured film.;SOLUTION: The photosensitive polyimide precursor composition contains (A) a compound selected from a benzoquinone compound, a phenol compound, a catechol compound, a resorcinol compound and a hydroquinone compound, in which a hydrogen atom bonding to the ring may be substituted by a substituent, (B) a photosensitive polyimide precursor having a photosensitive group and a group exhibiting acidity and (C) a sensitizer. The rate of dissolution of a film formed by applying and drying the composition in a basic aqueous solution is 0.01-0.5 μm/sec.;COPYRIGHT: (C)2000,JPO