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COMPOSITIONS FOR THE STRIPPING OF PHOTORESISTS IN THE FABRICATION OF INTEGRATED CIRCUITS
COMPOSITIONS FOR THE STRIPPING OF PHOTORESISTS IN THE FABRICATION OF INTEGRATED CIRCUITS
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机译:集成电路制造中用于光致抗蚀剂剥离的组合物
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摘要
A photoresist stripping composition, consisting of dimethyl sulfoxide or n-methyl pyrrolidone and 3-methoxy propylamine, is A novel photoresist stripping composition consists of (by wt.) 30-95% dimethyl sulfoxide (DMSO) or n-methyl pyrrolidone (NM and 70-5% 3-methoxy propylamine (MOPA).
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