COMPOSITIONS FOR THE STRIPPING OF PHOTORESISTS IN THE FABRICATION OF INTEGRATED CIRCUITS

摘要

THE INVENTION RELATES TO A COMPOSITION FOR USE IN THE STRIPPING OF PHOTORESISTS FOR THE FABRICATION OF INTEGRATED CIRCUITS.ACCORDING TO THE INVENTION, THERE IS USED A MIXTURE OF DIMETHYL SULPHOXIDE (DMSO) OR N-METHYLPYRROLIDONE (NMP) AND 3-METHOXYPROPYLAMINE (MOPA). ADVANTAGEOUSLY, A LITTLE WATER AND A CORROSION INHIBITOR, SUCH AS SODIUM TOLYLTRIAZOLATE, ARE ADDED TO THE MIXTURE.