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Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography
Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography
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机译:获得极紫外辐射源的方法,辐射源及其在光刻中的应用
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摘要
Method for obtaining extreme ultraviolet radiation and a source thereof, application in lithography. According to the invention, at least a solid target ( 28 ) is used, emitting extreme ultraviolet radiation by interaction with a laser beam focussed on a face ( 30 ) of the target. This target is able to emit a portion of the radiation from the opposite face ( 37 ) and this portion is collected and transmitted.
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