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Method for obtaining an extreme ultraviolet radiation source radiation source and use in lithography
Method for obtaining an extreme ultraviolet radiation source radiation source and use in lithography
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机译:获得极紫外辐射源辐射源的方法及其在光刻中的应用
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摘要
The present invention relates to a method of using at least one solid target (28) that emits extreme ultraviolet radiation by interacting with a laser beam focused on a surface (30) of the target. The target can emit a portion of its extreme ultraviolet light from the opposite surface 37 and the portion is collected and delivered.
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