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Aluminum compound for forming aluminum films by chemical vapor depositions and their synthesis
Aluminum compound for forming aluminum films by chemical vapor depositions and their synthesis
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机译:用于通过化学气相沉积形成铝膜的铝化合物及其合成
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摘要
Organometallic precursor compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic precursor compounds and methods of forming aluminum films.
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