Heteroleptic aluminum hydride compounds: Synthesis, thermolysis, and application in aluminum metal thin film deposition through chemical vapour methods.

摘要

The synthesis of five 5-coordinate amidinate hydrido aluminum compounds with general structure [R(NC(NiPr)2] 2AIH using ligand exchange and hydrogen elimination methods. Compounds 1-5, with R= NMe2, NEt2, NiPrH, NiPr2, and Me, were isolated with respective yields of 85%, 86%, 93%, 78%, and 16%. The five compounds were investigated as potential precursors for atomic layer deposition (ALD): structural and thermal characteristics were studied using melting point, sublimation temperature, single crystal X-ray diffraction (scXRD), thermogravimetric analysis (TGA), 1H NMR studies, and time-of-flight mass spectroscopy (TOF-MS). Pulsed chemical vapour deposition (CVD) experiments were performed with compound 3 and forming gas (5% H2 in N2). Deposited films were characterized using scanning electron microscopy (SEM) and powder X-ray diffraction (pXRD) and determined to be aluminum metal in a cubic closest packed (ccp) arrangement.