Formation of suspended beams using soi substrates and application to the fabrication of a vibratory gyrometer

摘要

A method of manufacturing a micro-engineering sensor 101 according to the present invention includes the steps of forming an insulating layer 6 on the surface of a first wafer 4 that bonds a second wafer 2 to an insulating layer 6, One of the first wafer 4 or the second wafer 2 is patterned and formed so that the channels 18 and 20 are created in the first wafer 4 or the second wafer terminated adjacent to the insulating layer 6 Etching sequentially; And;b) etching the insulating layer to remove portions of the insulating layer 6 below the etched portions below the etched portions, i.e. the suspended portions 22, so that they are substantially free to be suspended on the unetched wafer Etching. This method uses silicon according to the insulator technology. Also disclosed is a micro-engineering gyrometer structure 101 that allows anisotropic silicon to be used to fabricate a sensor that functions as if made of isotropic silicon.