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Semiconductor Device with Quantum dot buffer in heterojunction structures

机译:异质结结构中具有量子点缓冲器的半导体器件

摘要

PURPOSE: A semiconductor device is provided to effectively prevent a lattice mismatch between a substrate and an epitaxial layer by using a quantum dot buffer layer of a heterojunction structure. CONSTITUTION: In the semiconductor device of the heterojunction structure including a substrate and a plurality of epitaxial layers grown on the substrate, a quantum dot buffer layer is formed between the substrate and the epitaxial layers. The quantum dot buffer layer is formed by MBE(molecular beam epitaxy), CVD, VPE(vacuum plasma epitaxy) or LPE method. The substrate is used as a compound semiconductor, such as GaAs, Si, InP, or sapphire.
机译:目的:提供一种半导体器件,以通过使用异质结结构的量子点缓冲层有效地防止衬底与外延层之间的晶格失配。构成:在具有衬底和在衬底上生长的多个外延层的异质结结构的半导体器件中,在衬底和外延层之间形成量子点缓冲层。量子点缓冲层通过MBE(分子束外延),CVD,VPE(真空等离子体外延)或LPE方法形成。衬底用作化合物半导体,例如GaAs,Si,InP或蓝宝石。

著录项

  • 公开/公告号KR20010090165A

    专利类型

  • 公开/公告日2001-10-18

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20000014820

  • 发明设计人 KIM MUN DEOK;LEE SEONG GUK;

    申请日2000-03-23

  • 分类号H01L29/737;

  • 国家 KR

  • 入库时间 2022-08-22 01:12:49

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