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Gate - controlled diode and method for producing the same.

机译:栅控二极管及其制造方法。

摘要

PURPOSE: To obtain a semiconductor device which is low in ON-state voltage, high in switching speed, and small in switching loss. ;CONSTITUTION: An N- epitaxial layer 1 provided with a P+ substrate 2 and a projection 3, an N+ diffusion region 4, and a P+ diffusion region 13 are formed between electrodes 9 and 10, and control electrodes 6 are formed on an insulating film 5 sandwiching the N+ diffusion region 4 and the projection 3 between them. With the electrode 10 at a higher potential than the electrode 9, the potential at the control electrodes 6 is varied whereby a potential barrier is generated or conductivity modulation is produced inside the N- epitaxial layer 1, so that a semiconductor device is turned ON or OFF. By this setup, holes injected at a turn-OFF time are extracted through the P+ diffusion region 13, and the P+ diffusion region 13 is lessened in resistance and distance without changing the N+ diffusion region 4 in area when the holes are drawn out. Therefore, a semiconductor device can be lessened in switching loss and enhanced in switching speed as kept low in ON-state voltage.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:获得一种半导体器件,该半导体器件的导通电压低,开关速度高并且开关损耗小。 ;组成:N -外延层1,具有P + 衬底2和突起3,N + 扩散区域4,以及在电极9与电极10之间形成有P + 扩散区域13,在夹着N + 扩散区域4和突起3的绝缘膜5上形成有控制电极6。它们之间。当电极10的电位高于电极9的电位时,控制电极6上的电位发生变化,从而在N -外延层1内部产生势垒或产生电导率调制,从而半导体器件被打开或关闭。通过这种设置,通过P + 扩散区域13提取在关闭时间注入的空穴,并且P + 扩散区域13的电阻和距离减小,而没有当抽出孔时,改变N + 扩散区域4的面积。因此,在保持导通电压低的情况下,可以减小半导体器件的开关损耗并提高其开关速度。;版权所有:(C)1993,JPO&Japio

著录项

  • 公开/公告号DE69328985T2

    专利类型

  • 公开/公告日2001-03-01

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI K.K. TOKIO/TOKYO;

    申请/专利号DE1993628985T

  • 发明设计人 TERASHIMA TOMOHIDE;

    申请日1993-03-01

  • 分类号H01L29/72;H01L21/33;

  • 国家 DE

  • 入库时间 2022-08-22 01:08:41

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