首页> 外国专利> QUANTITATIVE DETERMINATION DEVICE FOR COPPER IN SILICON BY TRANSIENT IONIC DRAINAGE (DIT) AND METHOD USING THE SAME

QUANTITATIVE DETERMINATION DEVICE FOR COPPER IN SILICON BY TRANSIENT IONIC DRAINAGE (DIT) AND METHOD USING THE SAME

机译:瞬态离子排水(DIT)定量测定硅中铜的装置及其使用方法

摘要

The invention concerns an analysing device for producing measurements using transient ionic drift technique and an analysis method using same. The device for the quantitative detection of copper in silicon by transient ionic drift essentially comprises means for heating and means for rapidly cooling the sample to be analysed, an electrode for measuring the electrical capacity of the sample and a unit generating an energising signal and processing the measuring electric signal. The invention is characterised in that the means for heating (2) the sample (4) to be analysed consists in at least a halogen lamp, the means for rapidly cooling (3) the sample (4) to be analysed is by water cooling, and the electrode for measuring the sample (4) to be analysed is a mercury electrode.
机译:本发明涉及一种用于使用瞬态离子漂移技术产生测量结果的分析装置以及一种使用该分析装置的分析方法。通过瞬时离子漂移定量检测硅中铜的装置主要包括加热装置和用于快速冷却待分析样品的装置,用于测量样品电容的电极以及用于产生激励信号并处理样品的单元测量电信号。本发明的特征在于,用于加热(2)待分析样品(4)的装置至少包括卤素灯,用于快速冷却(3)待分析样品(4)的装置是通过水冷却,测定试样(4)的电极为汞电极。

著录项

  • 公开/公告号FR2795822A1

    专利类型

  • 公开/公告日2001-01-05

    原文格式PDF

  • 申请/专利号FR19990008522

  • 发明设计人 HEISER THOMAS;

    申请日1999-06-30

  • 分类号G01N33/20;

  • 国家 FR

  • 入库时间 2022-08-22 01:07:53

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