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Method and apparatus to improve the uniformity of ion beam deposited films in an ion beam sputtering system
Method and apparatus to improve the uniformity of ion beam deposited films in an ion beam sputtering system
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机译:在离子束溅射系统中改善离子束沉积膜均匀性的方法和装置
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摘要
An ion beam sputtering system having a chamber and a target, a substrate, and a movable flux regulator located between the target and the substrate in the chamber. The position of the movable flux regulator relative to the deposition substrate affects the thickness uniformity of thin films deposited on the substrate in the ion beam sputtering system.
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