Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films

摘要

Films produced by reactive-dc-magnetron sputtering are generally dense and homogeneous. Thus their optical properties are similar to those of ion-beam-sputtered films and distinct from the properties of the more porous electron-beam evaporated films. In this paper, the measured results of the dispersive refractive index n and extinction coefficient k are presented for single- layer films of SiO$-2$/, Al$-2$/O$-3$/, HfO$-2$/, Ta$-2$/O$-5$/, Nb$-2$/O$-5$/, and TiO$-2$/ produced by the three processes. For some of the magnetron-sputtered films, it was necessary to modulate the dc power supply in order to suppress the electrical arcing at the target.