首页>
外国专利>
Photo-assisted post exposure bake for chemically amplified photoresist process
Photo-assisted post exposure bake for chemically amplified photoresist process
展开▼
机译:光辅助曝光后烘烤,用于化学放大的光刻胶工艺
展开▼
页面导航
摘要
著录项
相似文献
摘要
Acid diffusion induced critical dimension change in a chemically amplified photoresist process is suppressed by lowering the reaction activation energy barrier. Energy required to overcome the reaction activation energy barrier is provided directly to the chemical bonds that are involved in the chemical reactions, rather than providing energy solely by thermal heating, thereby significantly increasing reaction rate without increasing acid diffusion.
展开▼