首页> 外国专利> Bilayer interlayer dielectric having a substantially uniform composite interlayer dielectric constant over pattern features of varying density and method of making the same

Bilayer interlayer dielectric having a substantially uniform composite interlayer dielectric constant over pattern features of varying density and method of making the same

机译:在密度不同的图案特征上具有基本均匀的复合层间介电常数的双层层间电介质及其制造方法

摘要

A bilayer interlayer dielectric having a spun-on low k gap filled layer is capped with a higher k dielectric layer. Prior to the capping, the spun-on low k dielectric layer is planarized to reduce or eliminate the systematic variation in the relative thickness of the layers due to pattern density effects on the thickness of the spun-on low k dielectric layer. By removing the variations in the relative thickness of the low k dielectric layer and the capping layer, the effective dielectric constant of the uniformly thick composite interlayer dielectric is independent of location on the circuit, preventing differences in circuit speed and the creation of clock skew in the circuit.
机译:具有旋转的低k间隙填充层的双层层间电介质被较高k的电介质层覆盖。在封盖之前,将旋涂的低k电介质层平坦化以减少或消除由于图案密度对旋涂的低k电介质层的厚度的影响而导致的层的相对厚度的系统变化。通过消除低k介电层和覆盖层相对厚度的变化,均匀厚的复合层间电介质的有效介电常数与电路上的位置无关,从而防止了电路速度的差异和时钟偏斜的产生。电路。

著录项

  • 公开/公告号US6291339B1

    专利类型

  • 公开/公告日2001-09-18

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICES INC.;

    申请/专利号US19990225218

  • 发明设计人 SIMON S. CHAN;STEVEN C. AVANZINO;

    申请日1999-01-04

  • 分类号H01L214/263;H01L214/40;

  • 国家 US

  • 入库时间 2022-08-22 01:03:17

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