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PHOTOMASK PATTERN DEFECT INSPECTING METHOD AND DETECTING METHOD FOR FINE FIGURE PATTERN
PHOTOMASK PATTERN DEFECT INSPECTING METHOD AND DETECTING METHOD FOR FINE FIGURE PATTERN
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机译:精细图形图案的光掩模图形缺陷检查方法和检测方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for efficiently inspect a defect of a photomask after OPC correction.;SOLUTION: This is a photomask pattern defect inspecting method for detecting a defect part of a photomask by comparing the pattern of a photomask with mask drawing data by a specific inspecting machine; and figure pattern data as drawing data and figure pattern data arrangement information as drawing position information of the figure pattern data are included and the figure pattern data as the drawing data are processed by the OPC correction. The photomask is inspected according to the mask drawing data to previously extract a fine figure pattern, such as a TEG pattern (test structure) of a part other than the OPC-corrected part as a fine figure pattern which should not be detected originally as a defective part, but is frequently detected as a defect part and when the photomask is inspected, the fine figure pattern part which should not be detected as a defect part originally is not regarded as a defect.;COPYRIGHT: (C)2002,JPO
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