METHOD FOR CLEANING DEPOSITION FILM FORMING DEVICE, DRY ETCHING METHOD, AND METHOD FOR MANUFACTURING ARTICLE INCLUDING STEP OF EXECUTING EITHER OF THE METHODS

摘要

PROBLEM TO BE SOLVED: To provide a method for cleaning deposition film forming device, by which a high-quality deposited film of, particularly, high quality electrophotographic sensitive material can be obtained stably, by efficiently removing by-products in a reaction vessel, a dry etching method, and to provide a method of manufacturing article including a step of executing either of the methods.;SOLUTION: In the method for cleaning deposition film forming device, in which the inside of a deposition film forming device which forms a deposited film on a substrate set in the reaction vessel, permitting evacuation, is cleaned by using a cleaning gas and high-frequency power, the supply of the high-frequency power is temporarily stopped in the course of the cleaning operation, and then the cleaning operation is restarted at the cleaning of the inside of the deposition film forming device.;COPYRIGHT: (C)2002,JPO