首页> 外国专利> SILICIDE STATIC DISCHARGE PROTECTIVE CIRCUIT, SEMICONDUCTOR INTEGRATED CIRCUIT AND SILICIDE STATIC DISCHARGE PROTECTIVE CIRCUIT THEREFOR

SILICIDE STATIC DISCHARGE PROTECTIVE CIRCUIT, SEMICONDUCTOR INTEGRATED CIRCUIT AND SILICIDE STATIC DISCHARGE PROTECTIVE CIRCUIT THEREFOR

机译:硅化物静电放电保护电路,半导体集成电路及其硅化物静电放电保护电路

摘要

PROBLEM TO BE SOLVED: To provide an ESD protective circuit simplifying steps and having good ESD characteristics and an integrated circuit.;SOLUTION: The silicide static discharge protective circuit comprises an NMOS transistor 231 having a silicide layer 308 on a gate electrode 30 and source/drain regions 304A, in such a manner that one of the self-source/drain regions is connected to a ground voltage terminal; and a PMOS transistor 232 having a silicide layer 308 on a gate electrode 305 and source/drain regions 306, in such a manner that a self-gate electrode is connected to a ground voltage terminal 309, one of the self-source/drain junction is connected to the other of the source/drain regions of the NMOS transistor, and the other of the self- source/drain regions is connected to a pad 310.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种ESD保护电路,该电路简化步骤并具有良好的ESD特性和集成电路。解决方案:硅化物静电放电保护电路包括NMOS晶体管231,该NMOS晶体管231在栅电极30上具有硅化物层308,并且源/漏极区304A,以使自源极/漏极区之一连接到接地电压端子;以及在栅电极305和源/漏区306上具有硅化物层308的PMOS晶体管232,以使自栅电极连接到接地电压端子309,自源/漏结之一NMOS晶体管的另一端连接到NMOS晶体管的源极/漏极区域,而自源极/漏极区域的另一端连接到焊盘310。版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP2002299461A

    专利类型

  • 公开/公告日2002-10-11

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC;

    申请/专利号JP20010273668

  • 发明设计人 JUNG JONG-CHUCK;

    申请日2001-09-10

  • 分类号H01L21/822;H01L21/8234;H01L27/04;H01L27/088;

  • 国家 JP

  • 入库时间 2022-08-22 00:59:49

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