首页>
外国专利>
The focusing die ion beam treatment null which accompanies electric charge
The focusing die ion beam treatment null which accompanies electric charge
展开▼
机译:聚焦模离子束处理无效带电荷
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: To control the charge-up of a sample by a method, wherein volatile fluid electrostatic-proof material is applied to a reticle, a mask or other samples before a repairing operation is started, and the volatile fluid is evaporated to leave conductive layers made of electrostatic-proof material. ;CONSTITUTION: A thin layer 105 made of conductive material is formed on the surface of a reticle 100. The reticle 100 has a transparent insulating substrate 110, and an opaque pattern is formed on the surface of one of the surfaces of the insulating substrate 110. The reticle 100, having the conductive material layer 105, is placed in the vacuum chamber of a focused ion beam(FIB) system. Then proper material is introduced into the vacuum chamber, while a region to be repaired is raster-scanned by the FIB.;COPYRIGHT: (C)1995,JPO
展开▼