POLYMERIC COMPOUND FOR PHOTORESIST, MONOMERIC COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN BY USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC PARTS

摘要

PROBLEM TO BE SOLVED: To provide a polymeric compound for photoresists having excellent transparency to a light source having a short wavelength of ≤160 nm, particularly to a fluorine laser beam.;SOLUTION: The polymeric compound for photoresists has at least one skeleton expressed by formula (1) (wherein R is an alicyclic skeleton; at least one of Rx1 is an electron-attracting group and the remaining may be the same or different and each is a hydrogen atom or a monovalent organic group, and R may contain a hetero atom and R and Rx1 may jointly form a ring), formula (2A), (2B) or (2C) (wherein at least one of Rx1 is an electron-attracting group and the remaining may be the same or different and each is a hydrogen atom or a monovalent organic group; R2 may be the same or different and each is a hydrogen atom or a monovalent organic group; n is an integer of 2-25; and the carbons constituting R2 may be bonded to at least two carbons to be selected from the carbons to which R2 is bonded to form a fuse ring structure).;COPYRIGHT: (C)2002,JPO