首页> 外国专利> SPIN TUNNEL MAGNETORESISTANCE EFFECT FILM AND ELEMENT, AND MAGNETORESISTANCE SENSOR USING THE SAME, AND MAGNETIC DEVICE AND METHOD OF MANUFACTURING THE SAME

SPIN TUNNEL MAGNETORESISTANCE EFFECT FILM AND ELEMENT, AND MAGNETORESISTANCE SENSOR USING THE SAME, AND MAGNETIC DEVICE AND METHOD OF MANUFACTURING THE SAME

机译:自旋隧道磁阻效应膜和元件,以及使用其的磁阻传感器,磁装置及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a spin tunnel magnetoresistance effect, a spin tunnel magnetoresistance effect element, and a magnetic device using the same, excellent in heat stability and showing a low enough resistance for a magnetic head and a large linear magnetic field sensitivity in the vicinity of zero magnetic flux.;SOLUTION: The spin tunnel magnetoresistance effect film is laminated by a magnetic thin film exchange-biased by an exchange-coupled antiferromagnetic material and a magnetic thin film for detecting magnetic field through a tunnel barrier layer with a magnetic thin film or an antiferromagnetic thin film (PtMn, PdMn, NiMn) laminated on a foundation layer (Ta, Zr, Hf) and takes 0.1 to 5 Angstroms for its surface unevenness. A control means for controlling the surface unevenness introduces oxygen, nitrogen, hydrogen, or mixed gas of them at partial pressure ranging from 10-6 Torr to 10-9 Torr to a film forming chamber, makes a temperature of a substrate 0°C or less, or oxidizes a surface of the foundation layer. A film stack laminated by high-permeability magnetic amorphous material and nonmagnetic metal conductive layer is used for a lower electrode material.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:为了提供自旋隧道磁阻效应,自旋隧道磁阻效应元件以及使用该元件的磁性器件,其热稳定性优异,并且对于磁头而言显示出足够低的电阻,并且对磁头具有大的线性磁场灵敏度。解决方案:自旋隧道磁阻效应膜是由通过交换耦合反铁磁材料进行交换偏置的磁性薄膜和用于通过具有磁性的隧道势垒层检测磁场的磁性薄膜层叠而成的薄膜或反铁磁薄膜(PtMn,PdMn,NiMn)层压在基础层(Ta,Zr,Hf)上,表面不平整度为0.1至5埃。用于控制表面不平整度的控制装置将氧气,氮气,氢气或它们的混合气体以10-6 Torr到10-9 Torr的分压引入到成膜室中,使基板温度达到0摄氏度或减少或氧化基础层的表面。下电极材料使用由高磁导率的磁性非晶材料和非磁性金属导电层层压而成的薄膜叠层。COPYRIGHT:(C)2002,JPO

著录项

  • 公开/公告号JP2002204002A

    专利类型

  • 公开/公告日2002-07-19

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP20000399868

  • 申请日2000-12-28

  • 分类号H01L43/08;G01R33/09;G11B5/39;H01F10/16;H01F10/32;H01L43/12;

  • 国家 JP

  • 入库时间 2022-08-22 00:58:09

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