首页> 外国专利> SYSTEM AND METHOD FOR FINDING OPERATION/TOOL CAUSING INTEGRATION DEFECT IN SEMICONDUCTOR MANUFACTURING FACILITIES

SYSTEM AND METHOD FOR FINDING OPERATION/TOOL CAUSING INTEGRATION DEFECT IN SEMICONDUCTOR MANUFACTURING FACILITIES

机译:查找半导体制造设施中的操作/工具引起集成缺陷的系统和方法

摘要

PROBLEM TO BE SOLVED: To provide a method for finding a pair of operation/tool to defects in semiconductor-manufacturing facilities for treating a semiconductor wafer lot.;SOLUTION: To each lot in a lot list to the operation/tool of a candidate operation/tool list, specific positive and negative weighting values are assigned to conforming and nonconforming lots, respectively. A pair of operation/tool is selected form the candidate operation/tool list. The weighting value of each lot in a first lot list is successively added for forming a first accumulation value, a first peak accumulation value is formed as the maximum, first accumulation value during an addition process, a second accumulation value is formed in the same manner, and a second peak accumulation value is assigned. Each pair of operation/tool is ranked according to a peak combined accumulation value where the first peak accumulation value is added to the second one. The largest peak combined accumulation value tends to generate the defects.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:提供一种在处理半导体晶片的半导体制造设施中找到缺陷的一对操作/工具的方法。解决方案:对批次列表中的每个批次,查找候选操作的操作/工具/工具列表中,将特定的正负加权值分别分配给合格和不合格批次。从候选操作/工具列表中选择了一对操作/工具。依次相加第一批次列表中每个批次的权重值以形成第一累积值,第一峰值累积值形成为最大值,在相加过程中为第一累积值,第二累积值以相同方式形成,并分配第二个峰值累加值。每对操作/工具均根据峰值组合累积值进行排序,其中将第一峰值累积值添加到第二峰值/累积值。最大峰值组合累积值倾向于产生缺陷。;版权所有:(C)2002,日本特许厅

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