SPUTTERING TARGET FOR FORMATION OF OPTICAL LOGGING PROTECTION FILM CAPABLE OF DC SPUTTERING AND LOW IN ABNORMAL DISCHARGE

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target for the formation of an optical logging protection film made of sintered bodies composed of zinc sulfide-silicic and titanic compound oxide-indium oxide, and capable of DC sputtering.;SOLUTION: This sputtering target for the formation of the optical logging protection film capable of DC sputtering and low in abnormal discharge comprises 10-30 mole % silicic and titanic compound oxide, 0.5-30 mole % indium oxide and the balance of zinc sulfide.;COPYRIGHT: (C)2001,JPO