SPUTTERING TARGET FOR FORMATION OF OPTICAL LOGGING PROTECTION FILM CAPABLE OF DC SPUTTERING

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target for formation of an optical logging protection film which is made of zinc chalcogenide/silicon dioxide/indium oxide- based sintered compact and is capable of DC sputtering.;SOLUTION: This sputtering target comprises 10-30 mol% silicon dioxide, 0.5-30 mol% indium oxide and the balance zinc chalcogenide.;COPYRIGHT: (C)2001,JPO