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MANUFACTURING METHOD OF MICRO INDUCTANCE, AND STRUCTURE OF THE MICRO INDUCTANCE

机译:微电感的制造方法和微电感的结构

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method and a structure of micro inductance, made of a micro inductance coil in which a magnetic material is plated in the inside.;SOLUTION: An inductance base material includes a base 31, an insulating layer 32, a first metal layer 33, a first electric medium layer 34, a barrier layer 35, a second metal layer, an antireflection light beam layer 43, a second electric medium layer 37, a third metal layer 38, a third electric medium layer 39, and a protective layer 41. By using microphoto technique and etching technique, the protective layer 41, the third electric medium layer 39, the third metallic layer 38, and the second electric medium layer 37 are corroded to form a contact window. After the antireflection light beam layer 43 is corroded through the contact window, the second metal layer is corroded through the contact window to form a micro through-path. Finally, micro-electric plating operation is carried out, to grow a high iron magnetic material in the micro through-path, in the manufacturing method of the micro inductance and the structure of the micro inductance. In this way, the sensitiveness and the Q-value of the inductance can be increased, and efficiency of operation is enhanced.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种由微电感线圈制成的微电感的制造方法和结构,其中内部镀有磁性材料。;解决方案:电感基材包括基底31,绝缘层32第一金属层33,第一电介质层34,阻挡层35,第二金属层,抗反射光束层43,第二电介质层37,第三金属层38,第三电介质层39通过使用显微照片技术和蚀刻技术,保护层41,第三电介质层39,第三金属层38和第二电介质层37被腐蚀以形成接触窗。在抗反射光束层43通过接触窗被腐蚀之后,第二金属层通过接触窗被腐蚀以形成微贯通路径。最后,在微电感的制造方法和微电感的结构中,进行微电镀操作以在微贯通路径中生长高铁磁性材料。这样,可以提高电感的灵敏度和Q值,并提高工作效率。;版权所有:(C)2002,日本特许厅

著录项

  • 公开/公告号JP2002043155A

    专利类型

  • 公开/公告日2002-02-08

    原文格式PDF

  • 申请/专利权人 TONRIN HEKIREN;

    申请/专利号JP20000201709

  • 发明设计人 KAKURIN HEKIREN;

    申请日2000-07-04

  • 分类号H01F41/04;B81B1/00;B81C1/00;H01F17/04;

  • 国家 JP

  • 入库时间 2022-08-22 00:54:25

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