首页> 外国专利> MEASURING METHOD FOR IMAGE FORMING CHARACTERISTIC, MEASURING DEVICE FOR IMAGE FORMING CHARACTERISTIC, EXPOSURE METHOD, EXPOSURE DEVICE, AND MANUFACTURING METHOD FOR DEVICE

MEASURING METHOD FOR IMAGE FORMING CHARACTERISTIC, MEASURING DEVICE FOR IMAGE FORMING CHARACTERISTIC, EXPOSURE METHOD, EXPOSURE DEVICE, AND MANUFACTURING METHOD FOR DEVICE

机译:图像形成特性的测定方法,图像形成特性的测定装置,曝光方法,曝光装置以及装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a measuring method for an image forming characteristic, a measuring device for an image forming characteristic, an exposure method, an exposure device, and a manufacturing method for a device, capable of accurately measuring the image forming characteristic of an optical system in a simple constitution.;SOLUTION: The measuring device S for the image characteristic for measuring a numerical aperture of a projecting optical system PL has a mask M for generating diffraction light DL having different incident angles θ on the projecting optical system PL by the illumination of exposure light EL; a detector A capable of detecting the amount of light of the diffraction light DL passed through the projecting optical system PL; and an arithmetic unit CONT for calculating the numerical aperture NA of the projecting optical system PL based on the variation of the amount of light of the diffraction light DL having different incident angles θ detected with the detector A.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种图像形成特性的测量方法,一种图像形成特性的测量设备,一种曝光方法,一种曝光设备以及一种能够精确地测量感光鼓的图像形成特性的设备的制造方法。解决方案:用于测量投影光学系统PL的数值孔径的图像特性的测量装置S具有用于产生具有不同入射角θ的衍射光DL的掩模M。通过曝光光EL的照射在投影光学系统PL上;检测器A能够检测通过投影光学系统PL的衍射光DL的光量。运算单元CONT,用于基于入射角θ不同的衍射光DL的光量的变化来计算投影光学系统PL的数值孔径NA。 COPYRIGHT:(C)2002,JPO

著录项

  • 公开/公告号JP2002005787A

    专利类型

  • 公开/公告日2002-01-09

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20000183797

  • 发明设计人 TAKEUCHI YUICHIRO;

    申请日2000-06-19

  • 分类号G01M11/02;G03F7/20;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 00:53:23

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