首页> 外国专利> Integrated circuit ferroelectric memory devices including plate lines directly on ferroelectric capacitors and methods of fabricating the same

Integrated circuit ferroelectric memory devices including plate lines directly on ferroelectric capacitors and methods of fabricating the same

机译:包括直接在铁电电容器上的极板线的集成电路铁电存储器件及其制造方法

摘要

Integrated circuit ferroelectric memory devices are provided that include an integrated circuit transistor. The memory device further includes a ferroelectric capacitor on the integrated circuit transistor. The ferroelectric capacitor includes a first electrode adjacent the transistor, a second electrode remote from the transistor and a ferroelectric film therebetween. The memory device further includes a plate line directly on the ferroelectric capacitor. Methods are also provided that include forming a ferroelectric capacitor on the integrated circuit transistor and forming a plate line directly on the ferroelectric capacitor.
机译:提供了包括铁电晶体管的集成电路铁电存储器件。该存储器件还包括在集成电路晶体管上的铁电电容器。铁电电容器包括与晶体管相邻的第一电极,远离晶体管的第二电极以及在它们之间的铁电膜。该存储器件还包括直接在铁电电容器上的极板线。还提供了包括在集成电路晶体管上形成铁电电容器并且直接在铁电电容器上形成板线的方法。

著录项

  • 公开/公告号US2002105017A1

    专利类型

  • 公开/公告日2002-08-08

    原文格式PDF

  • 申请/专利权人 KIM HYUN-HO;KIM KI-NAM;

    申请/专利号US20020054540

  • 发明设计人 KI-NAM KIM;HYUN-HO KIM;

    申请日2002-01-22

  • 分类号H01L21/8238;

  • 国家 US

  • 入库时间 2022-08-22 00:49:58

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