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SrBi/sub 2/TaO/sub 9/ thin film capacitor model including polarization reversal response for nanosecond range circuit simulation of ferroelectric nonvolatile memory

机译:包含极化反转响应的SrBi / sub 2 / TaO / sub 9 /薄膜电容器模型,用于铁电非易失性存储器的纳秒范围电路仿真

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An SrBi/sub 2/Ta/sub 2/O/sub 9/ thin film capacitor model including polarization reversal response based on P-t curves is proposed for the nanosecond range circuit simulations of ferroelectric nonvolatile memories (NVFRAMs). The circuit simulation for the READ/WRITE operation of the NVFRAM is realized by the capacitor model and it's unique parameter extraction method. This approach provides a significant means for predicting the READ/WRITE operations of the NVFRAMs in the range from 10 ns to 1 /spl mu/s.
机译:针对铁电非易失性存储器(NVFRAM)的纳秒级电路仿真,提出了一种基于P-t曲线的包括极化反转响应的SrBi / sub 2 / Ta / sub 2 / O / sub 9 /薄膜电容器模型。 NVFRAM的READ / WRITE操作的电路仿真是通过电容器模型及其独特的参数提取方法实现的。这种方法提供了一种重要的手段,可以预测NVFRAM的READ / WRITE操作在10 ns至1 / spl mu / s的范围内。

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