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Ion implantation apparatus comprising protective insulator for preventing insulator from being polluted
Ion implantation apparatus comprising protective insulator for preventing insulator from being polluted
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机译:包括保护性绝缘体以防止绝缘体被污染的离子注入装置
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摘要
PURPOSE: Ion implantation equipment is provided to minimize an exposure of contaminated materials on an insulating body by using a protecting insulation body capable of overlapping an exposed portion of a cup support extraction of the insulating body included on a manipulator assembly. CONSTITUTION: The ion implantation equipment comprises a panel(40) formed with a through-hole for connection, a suppression electrode, a plate, a mounting, a suppressor, a cup support extraction(42), a support extraction(50), a shield electrode(52), and insulating bodies(44a) formed among the plate, the mounting, the suppressor and the support extraction(50) for insulating the assemblies one another in an ion implantation processing. The ion implantation equipment further includes protecting insulation bodies(44b) for preventing the insulating bodies(44a) from being contaminated by residual materials after the ion implantation processing.
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