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Ion implantation apparatus comprising protective insulator for preventing insulator from being polluted

机译:包括保护性绝缘体以防止绝缘体被污染的离子注入装置

摘要

PURPOSE: Ion implantation equipment is provided to minimize an exposure of contaminated materials on an insulating body by using a protecting insulation body capable of overlapping an exposed portion of a cup support extraction of the insulating body included on a manipulator assembly. CONSTITUTION: The ion implantation equipment comprises a panel(40) formed with a through-hole for connection, a suppression electrode, a plate, a mounting, a suppressor, a cup support extraction(42), a support extraction(50), a shield electrode(52), and insulating bodies(44a) formed among the plate, the mounting, the suppressor and the support extraction(50) for insulating the assemblies one another in an ion implantation processing. The ion implantation equipment further includes protecting insulation bodies(44b) for preventing the insulating bodies(44a) from being contaminated by residual materials after the ion implantation processing.
机译:目的:提供离子注入设备,以通过使用能够与机械手组件中包括的绝缘体的杯托提取物的裸露部分重叠的保护绝缘体来最大程度地减少绝缘体上受污染材料的暴露。组成:离子注入设备包括一个面板(40),该面板形成有用于连接的通孔,一个抑制电极,一个板,一个支架,一个抑制器,一个杯状支撑物提取物(42),一个支撑物提取物(50),一个屏蔽电极(52)和在板,安装件,抑制器和支撑件引出件(50)之间形成的绝缘体(44a),用于在离子注入过程中使组件彼此绝缘。离子注入设备还包括保护绝缘体(44b),以防止绝缘体(44a)在离子注入处理之后被残留材料污染。

著录项

  • 公开/公告号KR20020047869A

    专利类型

  • 公开/公告日2002-06-22

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20000076498

  • 发明设计人 PARK JI WON;

    申请日2000-12-14

  • 分类号H01L21/265;

  • 国家 KR

  • 入库时间 2022-08-22 00:30:48

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