首页> 外国专利> Method for preventing the formation of amines and similar organic compounds on insulator surfaces of nitrogen-insulated switching devices comprises providing the surfaces of the insulator parts with thin layers of inert inorganic materials

Method for preventing the formation of amines and similar organic compounds on insulator surfaces of nitrogen-insulated switching devices comprises providing the surfaces of the insulator parts with thin layers of inert inorganic materials

机译:防止在氮绝缘开关装置的绝缘体表面上形成胺和类似有机化合物的方法,包括在绝缘体部分的表面上提供惰性无机材料薄层

摘要

Method for preventing the formation of amines and similar organic compounds on insulator surfaces of nitrogen-insulated switching devices comprises providing the surfaces of the insulator parts with thin layers of inert inorganic materials. An independent claim is also included for a nitrogen-insulated switching device with a housing having an outer coating of insert inorganic material.
机译:防止在氮绝缘开关装置的绝缘体表面上形成胺和类似有机化合物的方法,包括在绝缘体部分的表面上提供惰性无机材料薄层。对于包括壳体的氮绝缘开关装置也包括独立权利要求,该壳体具有插入无机材料的外涂层。

著录项

  • 公开/公告号DE102005047046A1

    专利类型

  • 公开/公告日2007-04-05

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE20051047046

  • 发明设计人 HARTMANN WERNER;

    申请日2005-09-30

  • 分类号H01H33/662;H01H9/02;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:42

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