Process for the plasma-active vaporization in a vacuum comprises passing vapor on the path from the vaporizer to the substrate through a zone of high density plasma of a hollow cathode glow discharge

摘要

Process for the plasma-active vaporization in a vacuum comprises converting vaporized material (5) into a gaseous state in a directly or indirectly heated vaporizer (4); and plasma-activating the substrate (3) before deposition. The vapor on the path from the vaporizer to the substrate passes through a zone of high density plasma of a hollow cathode glow discharge which is produced by overlapping or coinciding negative glow light from opposite-lying flat elements acting as cathodes. An independent claim is also included for a vacuum coating device consisting of a evacuated chamber, units for converting coating material into the gaseous state, units for receiving and/or guiding a substrate to be coated, and units for maintaining a hollow cathode glow discharge.