Photomask original plate having film surface protective layer, manufacturing method thereof, and protective layer forming liquid for photomask original plate

摘要

The object of the present invention is to overcome the drawbacks of damage to the emulsion layer of the emulsion mask formed on the emulsion layer of the conventional method and to avoid the drawback of damage to the surface of the emulsion layer and the ease of contamination of the film surface, and the ultraviolet ray through the laminate protective film It is possible to prevent an excess rate drop and provide an inexpensive and durable photomask. The composition is composed of a mixture of fluororesin and acrylic resin on the surface of an emulsion photosensitive emulsion layer of a photomask original plate formed on a substrate surface (emulsion photomask) of an emulsion photosensitive emulsion layer, and acetic acid n-butyl and methyl ethane A crosslinking hardener mixed with a mixture of luketone (MEK) and methyl isobutyl ketone (MIBK) as a main agent, and a crosslinking hardener mixed with polyisocyanate prepolymer and ethyl acetate, and acetic N-n-butyl A dilute consisting of methyl ethyl ketone (MEK) and cellosolve acetate (ethylene glycol monoethyl ether)A photomask plate having a film surface protective layer is formed by coating a mixture of the protective layer forming liquid, which is formed by mixing and mixing, and aging is formed by laminating the film protective layer.