PHOTOMASK ORIGINAL FORM HAVING LAYER FOR PROTECTING FILM SURFACE AND METHOD FOR PREPARING THE SAME AND PROTECTIVE LAYER-FORMING LIQUID FOR PHOTOMASK ORIGINAL FORM

摘要

It is an object of the present invention to overcome the drawback that the protective layer of the second layer is formed on the emulsion layer of the emulsion mask manufactured by the conventional method and is easily scratched or the surface of the film is liable to become dirty, And it is intended to provide a photomask which is inexpensive and durable.;The constitution is such that on the film surface of the emulsion photosensitive emulsion layer of the photomask original plate formed by forming the film surface (emulsion photomask) of the emulsion photosensitive emulsion layer on the substrate, a mixed resin of a fluororesin and an acrylic resin, A crosslinking curing agent obtained by mixing a polyisocyanate prepolymer and ethyl acetate with a bisphenol type antifouling surface coating agent comprising a combination of a ketone (MEK) and a solvent mixed with methyl isobutyl ketone (MIBK) a protecting layer forming liquid composed of a combination of n-butyl, methyl ethyl ketone (MEK) and cellosolve acetate (ethylene glycol monoethyl ether) is mixed and aged to form a film surface protective layer , A process for producing the same, and a protective layer forming solution thereof.