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Semiconductor photocathode apparatus using the same, and semiconductor photocathode

机译:使用其的半导体光电阴极装置和半导体光电阴极

摘要

PURPOSE: To provide a semiconductor photo-electric cathode device wherein the quantum efficiency is improved, and the aperture ratio is 100%, the separation of picture elements in the structure is not required, and the modulation of a signal is made possible. CONSTITUTION: A first semiconductor layer 20 (light absorbing layer) for generating electrons by responding to incidence of light, and provided with the p-type first impurity concentration is formed on a semiconductor base plate 10. A p-type second semiconductor layer 30 (electron transferring layer) of the second impurity concentration having the impurity concentration lower than the first impurity concentration is formed on the first semiconductor layer 20. A Schottky electrode 50 is in Schottky-contact with the p-type second semiconductor layer 30. A third semiconductor layer 40 (active layer) is formed on the front surface of the p-type second semiconductor layer 30 and also on the opening of the Schottky electrode 50. A semiconductor part 60 (channel lattice) of the third impurity concentration is embedded in the p-type second semiconductor layer 30. A lead pin RE5 is connected to the semiconductor part 60.
机译:目的:提供一种半导体光电阴极器件,其中提高了量子效率,并且开口率是100%,不需要在结构中分离像素,并且使得信号的调制成为可能。组成:第一半导体层20(光吸收层),用于响应光的入射而产生电子,并在半导体基板10上形成p型第一杂质浓度。p型第二半导体层30(在第一半导体层20上形成杂质浓度低于第一杂质浓度的第二杂质浓度的电子转移层)。肖特基电极50与p型第二半导体层30肖特基接触。在p型第二半导体层30的前表面以及肖特基电极50的开口部上形成层40(活性层)。在p中埋入第三杂质浓度的半导体部分60(沟道晶格)。型第二半导体层30。引脚RE5连接到半导体部分60。

著录项

  • 公开/公告号JP3433537B2

    专利类型

  • 公开/公告日2003-08-04

    原文格式PDF

  • 申请/专利权人 浜松ホトニクス株式会社;

    申请/专利号JP19940292977

  • 发明设计人 二橋 得明;

    申请日1994-11-28

  • 分类号H01J1/34;H01J29/38;H01J40/06;

  • 国家 JP

  • 入库时间 2022-08-22 00:20:48

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