METHOD FOR SMOOTHING ANNEALED SURFACE OF SUBSTRATE AND MASK FOR LASER ANNEALING

摘要

PROBLEM TO BE SOLVED: To provide a method for smoothing a laser annealed surface by using a mask having divided opening patterns and divided mask patterns.;SOLUTION: The method for smoothing the laser annealed surface comprises: the steps of illuminating a laser beam having a first wavelength; melting a substrate region by using a mask having a first shielding region having an opening pattern which includes a first size and an opening pattern which includes a second size smaller than the first size, and supplying a first energy density by illuminating the laser beam having a first energy density to the substrate region; crystallizing the substrate region; illuminating the diffracted laser beam to the substrate region; and smoothing the surface of the substrate by illuminating the diffracted laser beam. The above-described mask has divided opening patterns on an LILaC region and the surface smoothed region.;COPYRIGHT: (C)2004,JPO