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SOFT X-RAY SOURCE AND EUV EXPOSURE DEVICE

机译:软X射线源和EUV曝光设备

摘要

PROBLEM TO BE SOLVED: To provide a soft X-ray source comprising a discharge plasma source from which a larger amount of soft X-ray can be taken out than before. SOLUTION: An insulator 101 is formed of SiC ceramic and manufactured by rolling up and then baking a mesh-like processed sheet. The opening ratio of the mesh is 90%. An electrode 2 is formed of Mo having a high melting point. When charges are accumulated in a capacitor 4 and then a switch 5 is closed, discharging is started on the surface of the insulator 1, and a cylindrical plasma 6 is generated (b). A large amount of current flows through the plasma 6 between/to electrodes to form a magnetic field, and the magnetic field thus formed compresses the cylindrical plasma 6 in the center axial direction to converge (pinch) the plasma 6 (c). The plasma 6 thus pinched radiates soft X-ray 7. The soft X-ray radiated is discharged from the openings of the mesh of the insulator 101 to the outside, and thus the solid angle at which the soft X-ray can be taken out is larger than ever before.
机译:解决的问题:提供一种包括放电等离子体源的软X射线源,可以从中取出比以前更大数量的软X射线。解决方案:绝缘体101由SiC陶瓷制成,并通过卷起然后烘烤网状加工过的板材来制造。网眼的开口率为90%。电极2由具有高熔点的Mo形成。当电荷累积在电容器4中,然后闭合开关5时,在绝缘子1的表面开始放电,并产生圆柱形等离子体6(b)。大量电流在电极之间/至电极之间流过等离子体6以形成磁场,并且由此形成的磁场在中心轴向上压缩圆柱形等离子体6以使等离子体6(c)会聚(收缩)。如此被挤压的等离子体6放射出软X射线7。放射出的软X射线从绝缘体101的网眼的开口向外部排出,由此可以取出软X射线的立体角。比以往任何时候都大。

著录项

  • 公开/公告号JP2003077698A

    专利类型

  • 公开/公告日2003-03-14

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20010262987

  • 发明设计人 MURAKAMI KATSUHIKO;

    申请日2001-08-31

  • 分类号H05G2/00;G03F7/20;G21K5/02;G21K7/00;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:57

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